Effective for vitreous silica at high temperatures
Etching contrast ~1:300 for laser-modified fused silica
Etching rates comparable to Hydrofluoric Acid (HF) for irradiated tracks
Safer alternative to HF
Strong dependence on temperature and concentration
[2]
Strong alkali
Conducting electrolyte for electrochemical etching
[3]
Liquid absorbent in Direct Air Capture (DAC) systems
Reacts with CO₂ to form potassium carbonate
Regenerated for cyclic CO₂ capture
[1]
Etchant in FLICE for hollow structures in fused silica
Dissolving laser-irradiated areas in glass
Alternative to NaOH and HF in micromachining
[2]
Electrolyte solution (0.5M) for fabricating cylindrical submicron tungsten tips via liquid membrane electrochemical etching.
[3]
Classification by use
Chemicals used in gas absorption
Chemicals used in direct air capture
Chemicals used in cyclic regeneration systems
[1]
Chemicals used as selective etchants
Agents for high-contrast etching in laser processing
[2]
Chemicals used in electrode fabrication/processing
Electrolytes for electrochemical machining
[3]
A trustworthy factory and manufacturer
[Cite:1] A Comparative Review of terrestrial and marine carbon dioxide removal (CDR) methods, Carbon Capture Science & Technology, Volume 18, March 2026, 100550
[Cite:2] Nanochannels in Fused Silica through NaOH Etching Assisted by Femtosecond Laser Irradiation, Materials, 2024, 17(19), 4906
[Cite:3] Electrochemical cutting of microslits on metallic glass using cylindrical submicron tips, Electrochemistry Communications, Volume 184, March 2026, 108112